Solitec 3000IR Mask Aligner

Solitec 3000IR Mask Aligner

Solitec 3000IR Mask Aligner

General Information

Equipment Name: Solitec 3000IR Mask Aligner

Location: 354 ERC

Max Wafer Size: 4”

 

System Information

General Description: The 3000IR is designed to provide precise, repeatable mask alignment and exposure for photolithography in a laboratory.  It offers all the functions necessary to produce high quality patterns on materials which can have a wide range of physical size and photolithographic properties.

Capabilities:

  • Mask size: 3 inch, 4 inch and 5 inch
  • Substrate sizes:  pieces to 100 mm
  • Range of alignment: X, Y ± 12.7mm and Theta ± 45°
  • Substrate movement is preformed with high precision micrometers for X, Y, and Theta axis resolution of 0.3μm
  • Alignment accuracy: 0.3μm for top side alignment
  • Mask rotation: ±3°
  • Exposure modes: proximity and vacuum contact adjustable
  • Infrared camera for backside wafer alignment
  • 350 mercury arc lap with a UV filters for 365 wavelength
  • Split field pneumatic microscope for alignment using 5X objectives

 

Useful System Links


Equipment Use Fees

Internal $10/hour External $30/hour
Staff time: Internal $40/hour External $80/hour

Schedule Training 

Documentation

Operators Manual

SOP